CHILAB Laboratory - Chivasso

Type Research laboratory
Site Structure in Chivasso: Palazzo Einaudi, Lungo Piazza d’Armi 6
Phone +39 011 9114899/090 8406
Dimension 800 mq
Equipment
  • Cleanroom composed of three different areas: an ISO 14644 Class 5 (U.S Fed-Std 209D Class 100) yellow area (15 m2); an ISO 14644 Class 6 (U.S Fed-Std 209D Class 1000) area (45 m2); a not classified grey area, but approximately an ISO 14644 Class 7 (U.S Fed-Std 209D Class 10000) area (90 m2).
  • Double side Mask Aligner
  • Laser Direct Writer
  • Reactive Ion Etcher (RIE)
  • Chemical Bench for Lithographic processes
  • Plasma Etcher
  • Chemical Benches for Wet Etching
  • E-Gun Evaporator
  • Rapid Thermal Annealer (RTA)
  • Plasma Enhanced Chemical Vapor Deposition (PECVD)
  • Low Pressure Chemical Vapor Deposition (LPCVD)
  • Oxidation furnace
  • Graphene deposition furnace
  • Electroplating
  • Anodic Bonding
  • Micro Powder Blasting
  • Hot Embossing
  • Micro Injection Moulding
  • Microfluidic characterization setup
  • CNC Milling
  • Optical Microscope
  • Profilometer
  • Micro Electro-Discharge Machining
  • 3D InkJet Printer
  • Microstereolithography
  • Fused Deposition Modeling
  • Polymeric powder 3D printing by Direct Laser Sintering
Staff