Laboratorio CHILAB - Materiali e Microsistemi - Chivasso

Tipologia Laboratorio di ricerca
Sede Sede di Chivasso: Palazzo Einaudi, Lungo Piazza d’Armi 6
Telefono +39 011 9114899/090 8406
Dimensione 800 mq
Attrezzature
  • Cleanroom composed of three different areas: a ISO 14644 Class 5 (U.S Fed-Std 209D Class 100) yellow area (15 m2); a ISO 14644 Class 6 (U.S Fed-Std 209D Class 1000) area (45 m2); a not classified grey area, but approximately a ISO 14644 Class 7 (U.S Fed-Std 209D Class 10000) area (90 m2).
  • Double side Mask Aligner
  • Laser Direct Writer
  • Reactive Ion Etcher
  • Chemical Bench for Lithographic processes
  • Plasma Etcher
  • Chemical Benches for Wet Etching
  • E-Gun Evaporator
  • Rapid Thermal Annealer
  • PECVD
  • LPCVD
  • Oxidation furnace
  • Graphene deposition furnace
  • Glove box for PZT sol-gel deposition
  • Electroplating
  • Anodic Bonding
  • Micro Powder Blasting
  • Hot Embossing
  • Micro Injection Moulding
  • 3D InkJet Printer
  • Microfluidic characterization setup
  • CNC Milling
  • Optival Microscope
  • Profilometer
Personale